JPH0430728U - - Google Patents

Info

Publication number
JPH0430728U
JPH0430728U JP7218790U JP7218790U JPH0430728U JP H0430728 U JPH0430728 U JP H0430728U JP 7218790 U JP7218790 U JP 7218790U JP 7218790 U JP7218790 U JP 7218790U JP H0430728 U JPH0430728 U JP H0430728U
Authority
JP
Japan
Prior art keywords
electrode
etched
dry etching
impedance
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7218790U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7218790U priority Critical patent/JPH0430728U/ja
Publication of JPH0430728U publication Critical patent/JPH0430728U/ja
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP7218790U 1990-07-04 1990-07-04 Pending JPH0430728U (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7218790U JPH0430728U (en]) 1990-07-04 1990-07-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7218790U JPH0430728U (en]) 1990-07-04 1990-07-04

Publications (1)

Publication Number Publication Date
JPH0430728U true JPH0430728U (en]) 1992-03-12

Family

ID=31609906

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7218790U Pending JPH0430728U (en]) 1990-07-04 1990-07-04

Country Status (1)

Country Link
JP (1) JPH0430728U (en])

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001144079A (ja) * 1999-09-03 2001-05-25 Ulvac Japan Ltd プラズマ処理装置
JP2008244063A (ja) * 2007-03-27 2008-10-09 Tokyo Electron Ltd プラズマ処理装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001144079A (ja) * 1999-09-03 2001-05-25 Ulvac Japan Ltd プラズマ処理装置
JP2008244063A (ja) * 2007-03-27 2008-10-09 Tokyo Electron Ltd プラズマ処理装置

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